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1

UV Activated Surface Preparation of Silicon for High-k Dielectric Deposition

Finstad, Casey C., Muscat, Anthony

Journal:

Solid State Phenomena

Year:

2005

Language:

english

File:

PDF, 199 KB

english, 2005

2

Removal of Copper from Silicon Surfaces Using Hexafluoroacetylacetone (hfacH) Dissolved in Supercritical Carbon Dioxide

Xie, Bo, Finstad, Casey C., Muscat, Anthony J.

Journal:

Chemistry of Materials

Year:

2005

Language:

english

File:

PDF, 410 KB

english, 2005

3

Native oxide removal from SiGe using mixtures of HF and water delivered by aqueous, gas, and supercritical CO2 processes

Bo Xie, Gerardo Montaño-Miranda, Casey C. Finstad, Anthony J. Muscat

Journal:

Materials Science in Semiconductor Processing

Year:

2005

Language:

english

File:

PDF, 282 KB

english, 2005

4

The mechanism of amine formation on Si(1 0 0) activated with chlorine atoms

Casey C. Finstad, Adam G. Thorsness, Anthony J. Muscat

Journal:

Surface Science

Year:

2006

Language:

english

File:

PDF, 509 KB

english, 2006

5

Ammonia Photodissociation Promoted by Si(100)

Finstad, Casey C., Muscat, Anthony J.

Journal:

Journal of Physical Chemistry A

Year:

2014

Language:

english

File:

PDF, 1.05 MB

english, 2014

6

Gas phase preparation and analysis of semiconductor surfaces in a clustered reactor apparatus

Finstad, Casey C., Montaño-Miranda, Gerardo, Thorsness, Adam G., Muscat, Anthony J.

Journal:

Review of Scientific Instruments

Year:

2006

Language:

english

File:

PDF, 1.17 MB

english, 2006